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Industrial Metallurgical Micro >> Industrial Microscopes
MJ6607 Industrial Metallurgical Microscope
Description  

MJ6607 Industrial Metallurgical microscope is developed and aimed at the semiconductor industry, wafer manufacturing, electronic information industry, metallurgical industry. Used as an advanced Metallurgical microscope, the user can experience its super performance when using it.It can be widely used to identify and analyze Semiconductor, FPD, Circuit encapsulation, circuit substrate, Material, Casting/Metal/Ceramic parts, Precision moulds and observe thicker specimen. High quality and reliable optical system brings much clearer and contrast image. The design meets with the ergonomics needs and makes you feel comfortable and relaxed in doing your job.


                       Specification               

Viewing Head

  Compensation Free Trinocular Head, Inclined 30㣨50mm-75mm

 

Eyepiece

  WF10/25mm

 

  WF10/20mm,crosshair with reticule 0.1mm

 

Objective

  Long working distance bright and dark field Infinite Plan objectives: 5
  /0.1B.D/W.D.29.4mm 10/0.25B.D/W.D.16mm  20/0.40B.D/W.D.10.6mm 40
  /0.60B.D/W.D.5.4mm

 

Nosepiece

  Quintuple Nosepiece with DIC Jack

 

Stage

  Double layer mechanical stage

 

  Stage Size: 190mm140mm

 

  Moving Range:50mm40mm

 

Filter

  Flashboard type filters(green,blue,neutral)

 

Focusing

  Coaxial coarse fine focusing adjustment With rack and pinion mechanism Fine
  focusing scale value 0.002mm

 

Light Source

  With aperture iris diaphragm and field iris diaphragm, halogen Bulb 12V/50W, 
  AC85V-230 Brightness Adjustable

 

Polarizing Device

  Analyzer rotatable 360,PolarizerAnalyzer can be moved in/out of the optical
  path

 

Checking Tool

  0.01mm Micrometer

 

Optional Accessory

  Two-dimensional measurement software

 

  Professional metallurgical image analysis software

 

  Halogen Bulb 12V/100W

 

  Micrometer eyepiece

 

  1.3Mega2.0 Mega3.0 Mega,5.0 Mega pixels CMOS Digital camera eyepieces

 

  Long working distance bright dark field Infinite Plan objectives: 50
  /0.55B.D/W.D.5.1mm 80/0.75B.D/W.D.4mm100/0.80B.D/W.D.3mm

 

  Precision Stage:X-Y moving range 25mm25mm,Moving Precision5um,Digital
  hand wheel Min.Value:0.1um,360Rotatable disc

 

  Photography attachment and CCD Adapter 0.50.570.75

 

  DIC102040100

 

  Planishing tool

 

  CCD Camera,colour 1/3High resolution 520 TV lines

 

Characteristicsand description

1.       UIS infinite-optical system.
2.       Adopt long-life halogen light source with much higher light efficiency.
3.       Bright and dark field, Polarization and differential interference function.
4.       The aspherical Kohler illumination, increasing the brightness of observation.
5.       WF10 25Super wide viewing field Eyepiece, long working distance
          metallurgical objective with bright and dark field
6.       The Quintuple Nosepiece can be equipped with detachable DIC differential
          interference device.

DIC: Nomarski differential interference contrast observation is deemed to the essential means to checkout the materials, semiconductor and metal structure now.

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